Basics: Everything about pattern and processing in 3D (205-EN)

Course description:
Without the pattern, no virtual sewing or 3D simulation of clothing is possible. The clothing pattern is a necessary basis. Optimally, a reliable pattern library can be used. The more tried-and-tested a pattern is, the more realistic the simulation result and the more reliable the virtual try-on. In this way, fitting problems can be identified and immediately remedied virtually, without having to sew a sample part. Another aspect is processing. How big is the influence and what can be realistically represented? In the workshop, the various requirements are discussed and potentials and limits are shown.

Target group:
Employees from all areas who work with or are confronted with 3D simulation of clothing. The workshop is oriented towards the user, but it also offers interesting insights for newcomers who are confronted with questions about the implementation of a 3D system.

Course management:
Simone Morlock, Christine Lörcher, Flora Zangue

You will receive the event documents in electronic form via download link.